Method and apparatus for separating composite member using fluid

ABSTRACT

To separate a composite member consisting of a plurality of bonded members without destructing or damaging it, a fluid is jetted against the composite member from a nozzle to separate it into a plurality of members at a position different from a bonding position.

BACKGROUND OF THE INVENTION

1. Field of the Invention

The present invention relates to a method and apparatus for separating acomposite member, separated members, and a semiconductor substrate andits production method.

2. Related Background Art

The formation of a single crystal Si semiconductor layer on aninsulating surface of a substrate is widely known as a semiconductor oninsulator (SOI) technique, and many efforts have been made to researchthis technique because devices produced using the SOI technique havemany advantages that cannot be achieved by bulk Si substrates used tofabricate normal Si integrated circuits.

The use of the SOI technique provides the following advantages:

(1) The dielectric separation can be easily made to attain highintegration.

(2) Radiation resistance is excellent.

(3) The stray capacity is reduced to attain high speed.

(4) The well formation process can be omitted.

(5) Latch-up can be prevented.

(6) The thickness can be reduced to provide a fully depleted fieldeffect transistor.

To achieve the many advantages of the device, methods for forming SOIstructures have been researched for decades. One of such known methodsis SOS (silicon on sapphire) in which Si is heteroepitaxially formed byCVD (chemical vapor deposition) on a single crystal sapphire substrate.This technique has been successful as the maturest SOI technique, butits applications are limited by a large amount of crystal defects due tothe misalignment of lattices in the interface between an Si layer and asapphire substrate, by the mixture of aluminum from the sapphiresubstrate into the Si layer, and in particular, by the high costs of thesubstrate and the still insufficient the enlargement of area of thedevice. More recently, an attempt has been made to implement an SOIstructure without the sapphire substrate. This attempt can be roughlyclassified into the following two methods.

1. After the surface of an Si single crystal substrate is oxidized, awindow is made in the oxidized film to expose a part of the surface ofthe Si substrate, and this part is used as a seed to allow a horizontalepitaxial growth to form an Si single crystal layer on the SiO₂ (in thiscase, an Si layer is deposited on SiO₂).

2. The Si single crystal substrate is used as an active layer and SiO₂is formed under this layer (this method does not require an Si layer tobe deposited).

Known means for realizing the above method 1 include a method forallowing the direct horizontal epitaxial growth of single crystal layerSi using CVD, a method of depositing amorphous Si and allowing itshorizontal epitaxial growth in a solid phase by thermal treatment, amethod of irradiating an amorphous or polycrystal Si layer withconverging energy beams such as electron or laser beams, and allowing asingle crystal layer to grow on SiO₂ by means of meltingrecrystallization, and a method of using a bar-like heater to scan amolten area in such a way that the scanning trace appears like a band(zone melting recrystallization). Although these methods have bothadvantages and disadvantages, they still have many problems in terms oftheir controllability, productivity, uniformity, and quality and none ofthem have been put to industrially practical use. For example, the CVDmethod requires sacrificial oxidization to provide flat films. The solidphase growth method provides poor crystallinity. The beam anneal methodhas problems in terms of the time required for converging-beam scanning,and control of the superposition of beams, and focusing. Among them, thezone melting recrystallization method is maturest and has been used toproduce relatively-large-scale integrated circuits on an experimentalbasis, but it still causes a large amount of crystal defects such assub-grains to remain in the device, thereby failing to fabricateminor-carrier devices and to provide sufficiently excellent crystals.

The above method 2 that does not use the Si substrate as a seed forepitaxial growth includes the following four methods.

(1) An oxide film is formed on an Si single crystal substrate with aV-shaped groove etched anisotropically in its surface, a polycrystal Silayer is deposited on the oxide film so as to be as thick as the Sisubstrate, and then an Si single crystal region surrounded by theV-shaped groove so as to be separated dielectricly is formed on thethick polycrystal Si layer by polishing from the rear surface of the Sisubstrate. This method provides excellent crystallinity but the stepsfor depositing polycrystal Si by a thickness of several hundred micronsand polishing the single crystal Si substrate from its rear surface toleave only the separated Si active layer have problems in terms ofcontrollability and productivity.

(2) SIMOX (Separation by Ion-Implemented Oxygen) that forms an SiO₂layer in an Si single crystal substrate by means of oxygen ionimplantation and that is the presently maturest technique due to itsexcellent compatibility with the Si process. To form an SiO₂ layer,however, 10¹⁸ ions/cm² or more of oxygen ions must be implanted,resulting in the need for a large amount of time for the implantation,thereby leading to reduced productivity. In addition, the costs ofwafers are high. Furthermore, this method cause a large amount ofcrystal defects to remain in the device and does not industriallyprovide a sufficient quality to fabricate minor-carrier devices.

(3) A method for forming an SOI structure by dielectric separationthrough the oxidization of porous Si. In this method, an N-type Si layeris formed like an island on a surface of a P-type Si single crystalsubstrate by proton-ion implantation (Imai et al., J. Crystal Growth,vol. 63, 547 (1983)) or by epitaxial growth and patterning. Only theP-type Si substrate is made porous by an anodization method using an HFsolution in such a way that the porous region surrounds the Si islandfrom the surface, and the N-type Si island is then oxidized at a highspeed for dielectric separation. In this method, the separating Siregion is determined prior to the device step, thereby limiting thedegree of freedom of device design.

(4) A method for forming an SOI structure using thermal treatment or anadhesive to bond an Si monocrystal substrate on a different Si singlecrystal substrate that is thermally oxidized is attracting attention.This method requires an active layer for a device to be formed as auniformly thin film. That is, the thickness of aseveral-hundred-micron-thick Si single crystal substrate must be reducedto the order of micron or less.

The following two methods can be used to provide a thinner film.

1) Thickness reduction by polishing

2) Thickness reduction by selective etching

The polishing in 1) cannot provide uniformly thin films easily. Inparticular, if the thickness is reduced to the order of submicron, thethickness variation will be several tens %, resulting in a seriousproblem for providing uniformity. The difficulty in achieving uniformityfurther increases with increasing size of the substrate.

In addition, although the etching in 2) is supposed to be effective inproviding uniform thin films, it has the following problems.

The selection ratio is at most 10² and is insufficient.

The surface obtained after etching is bad.

The crystallinity of the SOI layer is bad due to the use of ionimplantation or epitaxial or heteroepitaxial growth on a highconcentration B-doped Si layer.

A semiconductor substrate formed by bonding requires two substrates, oneof which is mostly uselessly removed and disposed of through polishingand etching, thereby wasting limited global resources. Thus, SOI withbonding presently has many problems in terms of its controllability,uniformity, and costs.

In addition, generally due to the disorder of the crystal structure of alight-transmissive substrate represented by glass, a thin film Si layerdeposited on the substrate can only form an amorphous layer or apolycrystal layer based on the disorder of substrates, and thereforehigh-performance devices cannot be produced. This is because sinceamorphous structure of the substrate is amorphous, an excellent singlecrystal layer cannot be obtained by simply depositing an Si layer. Thelight-transmissive substrate is important in producing a contact sensoror a projection liquid-crystal image display device that is alight-receiving element. Not only the improvement of pixels but also ahigh-performance drive element are required to attain higher density,higher resolution, and finer definition of the pixels in the sensor ordisplay device. Thus, to provide elements on the light-transmissivesubstrate, a single crystal layer of an excellent crystallinity isrequired.

Among such SOI substrate production methods, the method of forming anon-single-crystal semiconductor layer on a porous layer andtransferring the layer onto a supporting substrate via an insulatinglayer as disclosed in Japanese Patent Application Laid-Open No. 5-21338is very excellent due to the uniform thickness of the SOI layer, itscapability of maintaining the crystal-defect density of the SOI layer ata low level easily, the flatness of the surface of the SOI layer, noneed for an expensive apparatus of a special specification forfabrication, and the capability of using the same apparatus for variousSOI film thicknesses ranging from about several 100 Angstrom to 10micron.

Furthermore, by combining the above method with the method disclosed inJapanese Patent Application Laid-Open No. 7-302889, that is, by forminga nonporous single crystal semiconductor layer on a porous layer formedon a first substrate, bonding the nonporous single crystal layer onto asecond substrate via an insulating layer, separating the first substrateand the second substrate by the porous layer without destruction, andsmoothing the surface of the first substrate and forming porous layeragain for reuse, the first substrate can be used many times. This methodcan significantly reduce production costs and simplify the productionsteps.

There are several methods for separating the bonded substrates mutuallyto divide into the first substrate and the second substrate withoutdestruction. For example, one of them is to pull the substrate in adirection vertical to the bonded surface. Another method is to apply ashearing stress in parallel with the bonded surface (for example, movingthe substrates in the opposite directions within planes in parallel withthe bonded surface or rotating the substrates in the circumferentiallyopposite directions). A pressure can be applied to the bonded surface inthe vertical direction. Furthermore, a wave energy such as ultrasonicwaves can be applied to the separation region. A peeling member (forexample, a sharp blade such as a knife) can also be inserted into theseparation region in parallel with the bonded surface from the side ofthe bonded substrates. Furthermore, the expansion energy of a materialinfiltrated into the porous layer that functions as the separationregion may be used. The porous layer functioning as the separationregion may also be thermally oxidized from the side of the bondedsubstrates to expand the volume of this layer. The porous layerfunctioning as the separation region may also be selectively etched fromthe side of the bonded substrates to separate the substrates. Finally, alayer formed by ion implantation to provide microcavities may be used asthe separation region and the substrates may then be irradiated withlaser beams from the normal direction of the bonded surface to heat theseparation region containing the microcavity for separation.

However, these methods for separating the two bonded substrates mutuallyare ideally excellent, but all of them are not suitable for theproduction of semiconductor substrates. One of the difficulties is thatthe bonded semiconductor substrates are generally shaped like discs andhave a small thickness, for example, 0.5 to 1.0 mm and that the bondedportion has few relatively large recesses on which a jig can be caught.Thus, a method of catching on an orientation flat portion of eachsubstrate a jig having a recessed portion that fits the orientation flatportion and rotating the substrates in parallel with the bonded surface,or a method of catching the jig on a small recessed portion made in thebonded portion in the side of the bonded substrates to peel them arelimited. The pressure-based separation requires a very large pressure,thereby forcing the size of the apparatus to be increased. In the waveenergy method, the wave irradiation method must be substantiallyimproved to irradiate the bonded substrates with wave energyefficiently, and immediately after separation, the separated substratesmay partly contact and damage each other. In the separation from theside, the substrates may be bent to allow only their sides to be peeled,with their central portions remaining unseparated. In the method ofinserting the peeling member into the separation region from the side ofthe bonded substrates, the insertion of the peeling member may damagethe bonded surface between the substrates due to the friction of thepeeling member and the substrates.

One solution for avoiding these problems is to reduce the mechanicalstrength of the separation region appropriately. This method, however,may increase the possibility that the separation region is destroyed byan external impact prior to the bonding of the substrates. In such acase, part of the destroyed separation region may become particles andcontaminate the inside of the production apparatus. Although theconventional separation methods have the major advantages, they stillhave the above problems.

SUMMARY OF THE INVENTION

It is an object of this invention to provide an improved separationmethod and apparatus that can separate the bonded substrates mutuallywithout destruction to prevent the separated substrates from beingdamaged and that is unlikely to destroy the separation region prior tothe step of separating bonded substrates even when an external force isapplied thereto, thereby preventing the production apparatus from beingcontaminated with particles.

The feature of this invention resides in that a composite member havinga plurality of members as mutually bonded is separated into a pluralityof members at positions different from the bonded position (separationregion) of the plurality of members by jetting a fluid against thecomposite member.

With respect to the separation method, the composite member may be anymember having a separation region inside, whereas with respect to thesemiconductor substrate production method, it must have the followingstructure. A major example of the composite member is bonded substratesby bonding a first substrate and a second substrate, the first substratebeing a semiconductor substrate in which a separation region is formedas a layer in a portion located deeper than its surface and in paralleltherewith and in which the surface and the portion shallower than it hasno separation region. That is, when this invention is applied to thesemiconductor substrate production method, the members obtained afterseparation are not the same as the first and second substrates prior tobonding.

According to this invention, the separation region is located at aposition different from the bonding interface (junction surface) betweenthe first and second substrates. In the separation step, the substratesmust be separated by the separation region located at the positiondifferent from the bonding interface.

Thus, the separation region is adapted to be mechanically weaker thanthe bonding interface so that the separation region is destroyed beforethe bonding interface. Thus, when the separation region is destroyed, aportion of the surface side of the first substrate which has apredetermined thickness is separated from the first substrate whileremaining bonded on the second substrate, thereby transferring theportion to the second substrate. The separation region may be a porouslayer formed by the anodization method or a layer formed by ionimplantation to provide microcavities. These layers have a large amountof microcavities. This region may also be a heteroepitaxial layer inwhich distortion and defects are concentrated in crystal lattices.

The separation region may also be multiple layers of differentstructures. For example, it may consist of multiple porous layers havingdifferent porosities or a porous layer of a porosity changing in thedirection perpendicular to the layers, as required.

The layer transferred from the first substrate to the second substrateby, for example, separating the composite member comprising the firstand second substrates bonded together with each other via the insulatinglayer is used as a semiconductor layer (an SOI layer) on the insulatinglayer to fabricate a semiconductor device.

Jet of a fluid that can be used for the separation can be conducted by aso-called water jet method that injects a flow of high-pressure waterthrough a nozzle. Instead of water, this fluid may be an organic solventsuch as alcohol, an acid such as hydrofluoric or nitric acid, an alkalisuch as potassium hydroxide, or a liquid capable of selectively etchingthe separation region. A fluid consisting essentially of an abrasiveparticle-free liquid is preferable. Furthermore, a fluid consisting of agas such as air, a nitrogen gas, carbon dioxide, or a rare gas may beused. A fluid consisting of a gas or plasma that can etch the separationregion may also be used.

The above separation method can be applied to the semiconductorsubstrate production method to enable the following methods:

1) A semiconductor substrate production method comprising the steps ofpreparing a first substrate comprising a porous single crystalsemiconductor layer and a nonporous single crystal semiconductor layersequentially stacked on a substrate; bonding the first substrate and asecond substrate so as to provide a composite member having thenonporous single crystal semiconductor layer located inside; and jettinga fluid to the vicinity of the porous single crystal semiconductor layerin the composite member to separate the composite member at the poroussingle crystal semiconductor layer, or

2) a semiconductor substrate production method comprising the steps ofimplanting ions into a first substrate of a single crystal semiconductorat a predetermined depth to form an ion-implanted layer that can providea microcavity layer; bonding the first substrate and a second substratevia an insulating layer so as to provide a composite member in which theion-implanted surface of the first substrate is located inside; andjetting a fluid against the vicinity of the ion-implanted layer of thecomposite member to separate the composite member at the ion-implantedlayer. This invention thus provides the semiconductor substrateproduction method that can solve the conventional problems.

BRIEF DESCRIPTION OF THE DRAWINGS

FIGS. 1A, 1B and 1C are schematic views illustrating a method forseparating a composite member according to this invention;

FIGS. 2A and 2B are schematic views illustrating an example of a methodfor separating the composite member using a fluid according to thisinvention;

FIG. 3 is a perspective view showing an example of a separationapparatus according to this invention;

FIG. 4 is a sectional view showing another example of a separationapparatus according to this invention;

FIG. 5 is a perspective view showing yet another example of a separationapparatus according to this invention;

FIG. 6 is a schematic view showing still another example of a separationapparatus according to this invention;

FIG. 7 is a schematic view showing still another example of a separationapparatus according to this invention;

FIG. 8 is a schematic view illustrating another example of a method forseparating a composite member using a fluid according to this invention;

FIG. 9 is a schematic view showing another example of a separationapparatus according to this invention;

FIGS. 10A and 10B are schematic views showing yet another example of aseparation apparatus according to this invention;

FIG. 11 is a schematic view showing still another example of aseparation apparatus according to this invention;

FIG. 12 is a schematic view showing still another example of aseparation apparatus according to this invention;

FIG. 13 is a schematic view showing still another example of aseparation apparatus according to this invention;

FIG. 14 is a top view of another separation apparatus according to thisinvention;

FIG. 15 is a side view of the separation apparatus shown in FIG. 14;

FIG. 16 is a schematic view showing a state of separating the compositemember;

FIG. 17 is a sectional view of the separation apparatus shown in FIG.15, in its standby state;

FIG. 18 is a sectional view of the separation apparatus shown in FIG.15, in its substrate-holding state;

FIG. 19 is a sectional view of the separation apparatus shown in FIG.15, in its separating-operation starting state; and

FIG. 20 is a sectional view of the separation apparatus shown in FIG.15, in its separating-operation ending state.

DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS

FIGS. 1A to 1C are schematic views illustrating a method of separating acomposite member according to this invention.

FIG. 1A shows a state prior to the bonding of a first member 1 and asecond member 2. The first member 1 has inside a separation region 3which is a separation position of this member. The separation region 3shaped like a layer has a lower mechanical strength than a layer region5 located on the side of a bonding surface 4 a.

The two members 1 and 2 are bonded such that the bonding surface 4 a isfaced to a bonding surface 4 b in order to form a disc-like compositemember having a bonding interface 14, as shown in FIG. 1B. A fluid 7 isjetted from a nozzle 8 toward the end of the separation region 3 locatedon the side (end surface) 6 of the composite member. The separationregion 3 against which the fluid 7 is jetted is removed or collapsed.Thus, the composite member is separated into two members 11 and 12 atthe separation region 3, as shown in FIG. 1C.

The layer region 5 is not present on a separation surface 13 a of theseparated member 11, and a layer region 5 has been transferred onto abonding surface 4 b of the original second member 2 so as to expose aseparated surface 13 b.

Thus, a member having the thin layer region 5 on the second member 2 isobtained.

By forming the second member 2 and layer region 5 by using differentmaterials, a member having a heterogeneous bonding can be producedeasily. Specific examples of such materials include conductors,semiconductors, and insulators, and two of which are selected to formthe second member 2 and the layer region 5.

In particular, silicon, quartz, glass, or silicon having an insulatingfilm formed on its surface is preferably used as the second member.

A semiconductor material such as silicon, silicon germanium, siliconcarbide, gallium arsenide, or indium phosphorus is preferably used asthe layer region. The layer region of such a material may partiallyinclude an thin insulating layer.

The most preferred composite member that is separated into at least twois obtained by bonding two semiconductor substrates, or onesemiconductor substrate and one insulating substrate and is calledbonded substrates or bonded wafers.

Separating such a composite member provides a semiconductor substrate ofan excellent SOI structure.

Prior to bonding, the separation region is desirably formed inside asubstrate along the bonding surface.

The separation region may be fragile enough to allow the compositemember to be separated into two at the separation region by the jettedfluid and to prevent damage to other regions other than the separationregion.

Specifically, it can be made fragile by containing a plurality ofmicrocavities inside the separation region or implanting heterogeneousions to cause strain.

The microcavity is formed of pores of a porous body or bubbles generatedby ion implantation, as described below. The separation region ispreferably 0.1 to 900 μm and more preferably 0.1 to 10 μm.

The flow of a fluid used to execute separation according to thisinvention can be implemented by jetting the fluid through a nozzle. Amethod for converting the injected flow into thin beams at a high speedand a high pressure may be the water jet method using water as the fluidsuch as that introduced in “Water Jet” Vol. 1, No. 1, p. 4. In the waterjet that can be used for this invention, high-pressure water atseveral-thousand kgf/cm² pressurized by a high-pressure pump is jettedthrough a thin nozzle and can cut or process ceramics, metal, concrete,resin, rubber, or wood (an abrasive material such as SiO₂ grains isadded to water if the material is hard), remove a paint film from asurface layer, or wash the surface of a member. The water jet has beenmainly used to remove a part of the material, as described above. Thatis, water jet cutting has been carried out to remove a cut edge from amain member, and the removal of the paint film and the washing of themember surface has been executed to remove unwanted portions. If thewater jet is used to form the flow of a fluid according to thisinvention, it can be jetted toward the bonding interface on the side(end surface) of bonded substrates to remove at least a part of theseparation region from the side. In this case, the water jet is jettedagainst the separation region exposed on the side of the bondedsubstrates and against a part of the first and second substrates in thevicinity of the separation region. Then, the separation region of a lowmechanical strength is removed or destroyed by the water jet to separatethe composite member into two substrates without damage to eachsubstrate. Even if the separation region is not exposed on the side butis instead covered with a certain thin layer for any reason, the waterjet may be used to remove the layer covering the separation region onthe side and then to remove the separation region exposed from the side.

Although not often used in the prior art, the water jet may be jettedagainst a small recessed portion on the side of two bonded chamferedsubstrates, that is, on their circumference to penetrate and extendmicrocavities or pores in the separation region of a fragile structureto separate the bonded substrates. This operation is not intended toperform for cutting or removal, so little chips occur from theseparation region and the composite member can be separated without theneed for abrasive particles or damage to surfaces obtained byseparation, even if the material of the separation region cannot beremoved by the water jet. This is not a cutting or polishing effect buta kind of wedge effect provided by the fluid. Thus, this is veryeffective if there is a recessed or narrow gap on the side of the bondedsubstrates and the jetting force of the water jet is applied in adirection in which the substrates are peeled off at the separationregion. To obtain a sufficient effect, the side of the bonded substratesis preferably recessed rather than protruding.

FIGS. 2A and 2B show this effect. In FIGS. 2A and 2B, 901 and 911indicate first substrates, 902 and 912 second substrates, 903 and 913separation regions, 904 and 914 semiconductor layers, 905 and 915insulating layers, 906 and 916 bonding interfaces, 907 a jet of a fluid,and 908 and 918 the directions of forces applied to the substrates bythe fluid.

FIG. 2A conceptually shows the direction of a force applied to thesubstrates by the water jet when the side of the end of the bondedsubstrates is recessed. The force is applied in a direction in which therecessed portion is extended, that is, in a direction in which thebonded substrates are peeled off. On the contrary, FIG. 2B conceptuallyshows the direction of a force applied to the substrates by the waterjet when the side of the end of the bonded substrates is protruding. Inthis case, a force is not applied in the direction in which the bondedsubstrates are peeled off, so the substrates cannot be separatedmutually unless a part of the separation region can be initiallyremoved.

Even if the separation region is not exposed on the side but is insteadcovered with a certain thin layer for any reason, a sufficientseparation effect can be obtained when the side of the bonded substratesis recessed as described above because a force is applied in thedirection in which the vicinity of the separation region is extended todestroy the thin layer covering the separation region on the side andthen to extend and destroy the separation region. To efficiently receivethe flow of the water jet, the aperture width of the recessed portion isdesirably equal to or larger than the diameter of the water jet. Whenthis invention is applied to manufacture a semiconductor substrate,since the thickness of the first and second substrates is less than 1.0mm, the thickness of the bonded substrates, that is, of the compositemember is less than 2.0 mm. Since the aperture width of the recessedportion is normally about half this value, the diameter of the water jetis preferably 1.0 mm or less. Actually, a water jet of about 0.1 mmdiameter can be put to practical use.

The nozzle jetting the fluid may have any shape including a circle. Along slit-like nozzle can also be used. By jetting the fluid throughsuch a nozzle, thin band-like flows can be formed.

Various jet conditions of the water jet can be selected arbitrarilydepending on the type of the separation region or the shape of the sideof the bonded substrates. For example, the pressure of the jet and itsscanning speed, the diameter of the nozzle (≈the diameter of the waterjet) and its shape, the distance between the nozzle and the separationregion, and the flow rate of the fluid are important parameters.

In an actual separation step, separation can be achieved by scanning thenozzle along the bonded surface while jetting the water jet from adirection in parallel with the bonding surface or fixing the water jetwhile moving the bonded substrates in parallel. In addition, the waterjet may be scanned so as to draw a fan around the nozzle, or the bondedsubstrates may be rotated around the position of the fixed nozzle as arotational center if, as is often the case, the bonded substrates areshaped like discs such as wafers with orientation flats or notches.Furthermore, the water jet may be jetted against the separation regionfrom an angled direction as required instead of placing the nozzle inthe same plane as the bonded interface. The scanning of the water jet isnot limited to these methods but may be carried out by any other methodas required. Since the water jet has a very small diameter and theinjection direction is almost parallel with the surface of thesubstrate, vector resolution shows that a high pressure ofseveral-thousand kgf/cm² is rarely applied to the substrates. Since thewater jet applies a force of only several hundred grams to the bondedsubstrates except for the separation region, the substrates areprevented from being destroyed.

Instead of water, an organic solvent such as alcohol, acid such ashydrofluoric or nitric acid, or alkali such as potassium hydroxide, or aliquid that can selectively etch the separation region may be used.Furthermore, a gas such as air, nitrogen gas, carbon dioxide gas, orrare gas may be used as fluid. A gas or plasma that can etch theseparation region may also be used. As water to be used for a compositemember separation method introduced into the process of producing asemiconductor substrate, pure water with a minimized amount of animpurity metal and particles, and ultrapure water are desirably used,but the substrates may be washed and the impurity metal and particlesare removed after separation using the water jet, due to the perfectlow-temperature process. In particular, in this invention, the fluid ispreferably free of abrasive particles so as not to leave unwantedscratches in the substrates.

A semiconductor substrate according to this invention can be used tofabricate a semiconductor device and to form a single crystalsemiconductor layer on the insulating layer into a fine structureinstead of an electronic device.

FIG. 3 is a schematic view showing a separation apparatus according toone embodiment of this invention.

Reference numeral 101 denotes bonded wafers as a composite member; 102 afluid jet nozzle; 103 a vertical movement mechanism for adjusting thevertical position of the nozzle 102; 104 a horizontal movement mechanismfor adjusting the horizontal position of the nozzle 102; 115 ahorizontal movement mechanism for adjusting the horizontal position ofthe wafer; and 105 a wafer holder as a holder.

Reference numerals 113, 114, and 116 denote guides.

In the apparatus shown in FIG. 3, the wafer separation operation isperformed by using the movement mechanisms 103, 104, and 115 to alignthe nozzle 102 with the end of the separation region of the wafer 101and jetting a highly pressurized fluid from the nozzle 102 to the end ofthe separation region on the side of the wafer 101 while moving thenozzle in the horizontal and vertical directions with the wafer 101remaining fixed.

Reference numeral 106 indicates a backing material used as required andconsisting of a porous or nonporous elastic body.

FIG. 4 is a schematic perspective view showing another example of aseparation apparatus used for this invention. In FIG. 4, 401 indicatestwo semiconductor wafers of Si integrally bonded as a composite memberhaving inside a porous layer that acts as a separation region. Referencenumerals 403 and 404 indicate holders that suck and fix thesemiconductor wafer 401 using a vacuum chuck and that are rotatablymounted on the same rotating shaft. The holder 404 is fitted in abearing 408 and supported by a supporting stand 409, and its rear end isdirectly coupled to a rotating shaft of a speed control motor 410. Thus,controlling the motor 410 enables the holder 404 to be rotated at anyspeed. The other holder 403 is fitted in a bearing 411 and supported bythe supporting stand 409, and a compression spring 412 is providedbetween the rear end of the holder 403 and the supporting stand 409 toapply a force in a direction in which the holder 403 leaves thesemiconductor wafer 401.

The semiconductor wafer 401 is set so as to correspond to a recessedportion of a positioning pin 413 and is sucked and held by the holder404. The holder 404 can hold the middle of the semiconductor wafer 401by using the pin 413 to adjust the vertical position of the wafer 401.The holder 403 is moved leftward against the spring 412 to a position atwhich it sucks and holds the semiconductor wafer 401. In this case, arightward force is applied to the holder 403 by the compression spring412. The returning force applied by the compression spring 412 and theforce of the holder 403 for sucking the semiconductor wafer 401 arebalanced so that the force of the compression spring 412 will not causethe holder 403 to leave the wafer 401.

A fluid is fed from a jet pump 414 to the jet nozzle 402 and continuesto be output until the jet fluid is stabilized. Once the flow of thefluid has been stabilized, the nozzle is moved, a shutter 406 is opened,and the fluid is jetted from the jet nozzle 402 to the side of thesubstrate 101 against the center of thickness of the semiconductor wafer401. At this point, the holder 404 is rotated by the motor 410 to rotatethe semiconductor wafer 401 and holder 403. By jetting the fluid againstthe vicinity of the thickness-wise center of the semiconductor wafer401, the semiconductor wafer 401 is extended to cause a porous layer inthe semiconductor wafer 401 that is relatively weak to be destroyed andis finally separated into two.

As described above, the fluid is applied to the semiconductor wafer 401uniformly and a rightward force is applied to the holder 403 holding thesemiconductor wafer 401, so that separated semiconductor wafers 401 areunlikely to slide after separation.

The bonded wafer 401 can also be separated by scanning the nozzle 402 inparallel with the bonding interface (surface) of the bonded wafer 401without rotating the wafer 401. When, however, separation is executed byscanning the nozzle 402 without rotating the bonded wafer 401,high-pressure water at 2000 kgf/cm² is required for a nozzle diameter of0.15 mm, whereas only 200 kgf/cm² of pressure is required whenseparation is carried out by rotating the bonded wafer 401 with thenozzle 402 fixed.

This is because water is jetted to the center of the bonded wafer 401 toenable the water pressure to act efficiently as an extending forcecompared with the scanning of the nozzle.

The following effects can be obtained by reducing the water pressure.

1) The wafer can be separated without destruction.

2) A large number of jets can be simultaneously used due to theincreased available capacity of the pump.

3) The size and weight of the pump can be reduced.

4) A wider range of materials are available for the pump and piping toallow the apparatus to easily utilize pure water.

5) The sound of the pump and, in particular, of the jet is reduced toallow sound-proof measures to be taken easily.

The wafer holding means shown in FIG. 4 holds the wafer by using theholders 403 and 404 to pull the wafer from both sides, but the wafer mayalso be held by pressing it from both sides of the holders 403 and 404.In this case, the high-pressure water also advances while extending thebonded wafer 401 to form a small gap in them, and finally separates theminto two.

The smaller the contact portion between the holders 403 and 404 and thebonded wafer 401 is, the more flexibly the bonded wafer 401 can movewhen the high-pressure water extends the wafer 401. Stress concentrationcaused by the excessively high pressure and the presence of water in theseparation interface of the bonded wafer 401 serve to prevent cracks andto allow the wafer to be extended easily. These points enable effectiveseparation. For example, when the contact portion between the holders403 and 404 and the bonded wafer 401 has a diameter of 30 mm or less,the bonded wafer 401 does not crack and can be separated into two duringa single rotation of the bonded wafer 401, under the conditions of thenozzle having a diameter of 0.2 mm and the pressure of 400 kgf/cm².

In addition, the larger the contact portion between the holders 403 and404 and the bonded wafer 401 is, the more firmly the rear surface of thebonded wafer 401 is supported when the high-pressure water extends thewafer 401, thereby preventing cracks during separation. When the contactportion between the holders 403 and 404 and the bonded wafer 401 has adiameter of 100 mm or more, the bonded wafer 401 can be separated intotwo without cracks under the conditions of the nozzle having a diameterof 0.2 mm and the pressure of 400 kgf/cm².

If foreign matters such as particles are sandwiched between the holder403 or 404 and the bonded wafer 401, the bonded wafer 401 is no longerheld in the vertical direction to cause the nozzle 402 to be offset fromits perpendicular direction toward the top of the bonded wafer 401 tothe longitudinal or lateral direction, thereby failing to effectivelyhit the high-pressure fluid against the separation interface in thewafer 401. To prevent this, the surfaces of the holders 403 and 404 thatcontact the bonded wafer 401 can be formed with a large number of fineprotrusions to minimize the contact area in order to reduce the effectof possible sandwiched foreign matters.

In the supporting apparatus shown in FIG. 4, the holder 404 is rotatedto rotate the holder 403 with it, so that a slight force is effected inthe direction in which the rotation is stopped and torsion may occur inthe separation surface until the bonded wafer 401 is entirely separated.In this case, the holders 403 and 404 can be rotated synchronously toprevent torsion in the separation surface. This method is describedbelow in detail.

FIG. 5 shows another separation apparatus according to this invention.In this figure, numeral 204 indicates a wafer horizontal-drivemechanism, 205 a wafer carrier, and 206 a wafer transfer arm. As shownin this figure, the wafer cassette 205 is placed on a cassette stand 207such that a wafer 201 is arranged in the horizontal direction. The wafer201 is loaded on a wafer supporting stand 204 using a wafer loadingrobot 206. The wafer supporting stand 204 on which the wafer 201 isloaded is transferred to the position of high-pressure jet nozzles 202and 203 by a supporting stand movement mechanism such as a beltconveyor. A high-pressure fluid is jetted against a separation region ina recessed potion in the wafer formed by bevelling, through the nozzles202 and 203 of a fluid jet apparatus located on the side of the wafer,from a direction parallel with the bonded interface (surface) in thebonded wafer. In this case, the nozzles are fixed and the bonded waferis scanned in the horizontal direction to receive the high-pressurefluid along the recessed portion formed by bevelling. One or both of thenozzles 202 and 203 may be used as required.

This operation enables the wafer to be divided into two at a porous Silayer. Although not shown in the drawing, another loading robot storesthe separated wafers as a first and a second substrates.

In the horizontal jet method, the wafer need not be fixed and, afterseparation, is unlikely to jump out from the wafer supporting stand 204due to its own weight. Alternatively, after the wafer has been loaded onthe wafer supporting stand, a jump prevention pin may be installed onthe top of the wafer so as to protrude from the wafer supporting stand204 to over the wafer or the top of the wafer may be pressed softly.

Furthermore, a plurality of bonded wafers may be placed and set in thevertical direction relative to their surfaces, and one separation regionof the bonded wafers may then be separated through horizontal scanning.A wafer set jig may subsequently be moved in the vertical direction overa distance equal to the wafer interval to allow the second separationregion of the bonded wafer to be separated sequentially throughhorizontal scanning similarly to the first separation of the bondedwafers.

FIG. 6 schematically shows another separation apparatus according tothis invention. This figure conceptually shows a nozzle of a water jetapparatus used in this embodiment and its movement. As shown in FIG. 6,a bonded wafer 301 is held by a holder 310 so as to stand in thevertical direction. A high-pressure fluid is jetted against a recessedpotion of the wafer formed by bevelling, through the nozzle 302 of thejet apparatus located above the wafer, from a direction parallel withthe bonding interface (surface) of the bonded wafer. In this case, thenozzle 302 and a supporting point 303 that allows the nozzle tooscillate within a plane so as to draw a fan are placed in the sameplane as the bonded surface in the wafer. The nozzle is oscillatedwithin the bonded surface in the wafer to oscillate the flow of the jetwithin this surface. This operation enables the high-pressure jet to bemoved and jetted along the recessed portion or gap in the bondingportion in the edge of the bonded wafer. This in turn enables the fluidto be jetted against a wide separation region without the need for arobot that moves the nozzle within the bonding surface accurately or amore mechanically complicated mechanism for moving or rotating thebonded wafer.

FIG. 7 conceptually shows another separation apparatus according to thisinvention, that is, another method for jetting a jet 503 against theperiphery of a bonded wafer 501. The bonded wafer 501 is fixed by aholder 510 and a nozzle 502 can be rotated around the wafer to allow thejet 503 to be jetted against the bonding portion all over the edge ofthe wafer. The center of the wafer is held and a rail (not shown in thedrawing) concentric with the wafer is installed around the wafer 501,and a jig 512 with the nozzle 502 fixed thereto can be slid on the railto allow the jet 503 to be jetted against the bonding portion fromaround the wafer 501.

FIG. 8 shows another example of a separation apparatus according to thisinvention. In this figure, 601 is a first wafer, 602 is a second wafer,603 is a bonding surface, 604 is a fluid jet, 605 is a direction of aforce applied to the wafer by the fluid jet, and reference numeral 606indicates an angle between the fluid jet and the bonding surface.According to this embodiment, the positions of the nozzle 611 and holder610 are set so that the direction of the jet jetted from the nozzle 611is inclined at an angle α from a direction parallel with the separationsurface in the wafer.

The wafer can be held by the apparatus shown in FIG. 4 and the nozzlecan be disposed as shown in FIG. 8 to jet the fluid against the side ofthe wafer. Since the jet 604 is inclined at an angle α (606) from thebonding surface 603, different pressures are applied to the two wafers601 and 602. In the example shown in FIG. 8, a relatively small force isapplied to the wafer 602 toward which the jet is inclined, whereas alarger force is applied to the opposite wafer 601. When the jet isinclined at a side opposite to the wafer in which porous Si is formed,porous Si or a microcavity layer can be destroyed easily. Thus, thebonded wafers are desirably installed such that the wafer 601 containsporous Si.

FIG. 9 shows another separation apparatus according to this invention.In this figure, 705 and 706 are vertical drive mechanisms for fluid jetapparatus nozzles 702 and 703, 707 is a horizontal drive mechanism for awater jet apparatus nozzle 704, and 708 is a wafer holder.

A shown in FIG. 9, the wafer holder 708 is used to hold both sides ofthe bonded wafer 701 so as to stand in the vertical direction. In thiscase, a side of the wafer having an orientation flat portion is directedupward. A high-pressure fluid is jetted against a recessed potion or gapin the wafer 701 formed by bevelling, through the nozzles 702, 703, and704 of the plurality of (in this example, three) jet apparatuses locatedabove or on the side of the wafer, from a direction parallel with thebonding interface (surface) in the bonded wafer. The configuration ofeach nozzle is the same as in FIG. 3. In this case, the plurality ofnozzles 702, 703, and 704 are scanned along guides 711, 712, and 713 ina direction in which the high-pressure fluid moves along the gap formedby bevelling.

In this way, the bonded wafers are divided into two.

When only one nozzle is used, a high pressure is required that issufficient to separate the wafer over a distance corresponding to itsdiameter. When the pressure is only sufficient to separate the waferover a distance corresponding to its radius, the wafer must be turnedupside down and separated again over a distance corresponding to itsradius. The plurality of nozzles can be used to allow each nozzle toseparate the wafer only over a distance corresponding to its radius, andthe need to jet the high-pressure fluid against the wafer again afterturning it upside down is omitted, and the overall surface of the wafercan be separated during a single step.

FIGS. 10A and 10B show another separation apparatus according to thisinvention. In this figure, 801 is bonded wafers as a composite member,802 is a nozzle for a fluid jet, and 803 is a fluid. A high-pressurepure water is jetted against a gap in the wafer formed by bevelling,through the nozzle with slit-like openings of the jet apparatus locatedabove or on the side of the wafer, from a direction parallel with thebonding interface (surface) in the bonded wafer while allowing thebonded wafer to stand perpendicularly to the holder 811, as shown inFIGS. 10A and 10B. The slit is located parallel with the bondinginterface (surface) in the bonded wafer and positioned so that a linearflow of water is jetted accurately against the gap in the wafer formedby bevelling. A plurality of nozzles are scanned in a direction in whichthe high-pressure fluid moves along the gap formed by bevelling.

The need to scan the nozzle is omitted by increasing the length of theslit above the diameter of the wafer.

The effect of this slit-like nozzle is that the wafer can be dividedunder a lower pressure than with a single nozzle of a very smalldiameter. Despite the low pressure, by increasing the area from whichthe high-pressure fluid is jetted, the energy used to separate the wafercan be increased to enable it to be divided easily.

Not only a nozzle having a slit-like opening but also a plurality ofnozzles 1202 placed closely in a line to jet a fluid against a bondedwafer 1201 as shown in FIG. 11 can be used for this invention to obtainsimilar results. Reference numeral 1211 indicates a wafer holder.

FIG. 12 shows another separation apparatus according to this inventionwhich can use a plurality of jets to separate a plurality of wafers atthe same time. In a basic configuration of the apparatus in FIG. 12,components similar to those in FIG. 3 are installed independently. Awafer 1001 a is set on a holder 1005 a. A high-pressure fluid jettedfrom a nozzle 1002 a hits against a bevelled portion of the wafer 1001a. The nozzle 1002 a can be moved in a direction perpendicular to thesheet of the drawing by a horizontal-movement mechanism 1004 a whilejetting the high-pressure fluid against the bevelled portion. A similaroperation can be performed by the apparatus in the right of the figurehaving a nozzle 1002 b, a horizontal-movement mechanism 1004 b, and aholder 1005 b. This configuration doubles the throughput. Although thisfigure shows two sets of the jet apparatus, three or more of suchapparatuses may be installed.

In addition, when the high-pressure pump does not have a large capacity,the right wafer can be changed while the left high-pressure fluid isbeing jetted, and vice versa. This requires only one set of a loader andan unloader robots.

FIG. 13 shows another separation apparatus according to this inventionin which wafers 1101 a, 1101 b, 1101 c, 1101 d, and 1101 e are set on awafer holding means 1105. A plurality of nozzles 1102 a to 1102 e areinstalled in a set of nozzle movement mechanisms 1103 and 1104. Thenozzle interval is the same as the wafer fixation interval. The holdingmechanism and nozzle movement method are similar to those in FIG. 3.

By using the central axis of each wafer for alignment, the five wafersare each fixed between the holders 1115 a and 1115 b, between theholders 1115 b and 1115 c, between the holders 1115 c and 1115 d,between the holders 1115 d and 1115 e, or between the holders 1115 e and1115 f, all of which can move on a guide 1114 in the horizontaldirection.

A movable supply pipe 1112 acting as both a common fluid supply pipe anda nozzle vertical-movement mechanism is connected to the five nozzles1102 a to 1102 e via a distributor 1113.

After the amount and pressure of fluid jetted from each nozzle have beenstabilized at a nozzle standby position, all nozzles 1102 a to 1102 eare moved along the guide 1111 to a wafer separation position and thenfurther advance along the guide 1111 to separate the wafers.

Once the separation has been finished, the amount of jetted fluid isreduced or the jetting is stopped to return the nozzles to their standbypositions.

In the apparatuses shown in FIGS. 10A to 13, separation can be carriedout by jetting the fluid while rotating the holders for the wafers torotate the wafers.

FIGS. 14 and 15 are a top and a side views showing a separationapparatus for a composite member used for this invention.

This separation apparatus has a rotation synchronization mechanism andcan rotate a first holder for holding a first surface of the compositemember and a second holder for holding a second surface of the compositemember, at the same angular speed in the same direction.

When a rotational drive force is applied to only one surface of thecomposite member or synchronization such as that described above is notprovided, the following phenomenon is likely to occur.

Immediately before a wafer that is a composite member is completelyseparated over the entire wafer, there is a moment at which a very smallregion, which is finally separated, remains unseparated somewhere on theseparation surface. The following two separation modes can be assumeddepending on a position of this very small unseparated region.

A first mode is a case in which the unseparated region remains almost atthe center of the separation surface and a second mode is a case inwhich it remains in an area other than the center. FIG. 16 conceptuallyshows these modes.

The first mode occurs if separation progresses uniformly from thecircumference of the wafer toward its center or if the strength of thevicinity of the center of the separation surface is high. In this case,if a rotational drive force is applied to only one of the holders 21 ofone side of the wafer, this rotation causes the very small unseparatedregion to be twisted off and separated.

The second separation mode occurs if during the initial step of fluidjetting, a crack extends over the radius of the wafer or longer from acertain circumferential portion resulting in quick separation or if thestrength of areas other than the vicinity of the center of theseparation surface is high. In this case, if a rotational drive force isapplied to only one of the holders 21 of one side of the wafer, thisrotation causes shearing stress, thereby causing the very smallunseparated region to be separated.

This is because the opposite holder 22 is subjected to no independentdrive force and is only rotated through the wafer, causing a slightforce to be effected in a direction in which the rotation of the holder22 is stopped even if softly the holder 22 is held by a bearing.

Such torsion or shear causes complicated forces in directions other thanthe vertical one to be applied to the separation surface, resulting inthe unwanted separation of an area other than the separation surface.

Thus, when the wafer is separated while being rotated and if the waferis rotationally driven without allowing both sides of it to synchronizemutually, separation may occur from a surface other than a desiredseparation surface or the wafer or an active layer may be damaged. Thesephenomena may significantly reduce the yield.

A motor support 36 for supporting a motor 32 that can control the speedand a pair of shaft supports 37 and 38 for rotatably supporting a motorshaft 31 are fixed on a supporting stand 40.

Furthermore, a first holder support 33 for rotatably supporting theholder 21 and a second holder support 34 for rotatably supporting theholder 22 are fixed on the supporting stand 40.

A timing pulley 29 mounted on the motor shaft 31 and a timing pulley 25mounted at the rear end of a rotating shaft 23 of the holder 21 areconnected together in such a way as to rotate in the same direction bymeans of a timing belt 27.

Likewise, a timing pulley 30 mounted on the motor shaft 31 and a timingpulley 26 mounted at the rear end of a rotating shaft 24 of the holder22 are connected together in such a way as to rotate in the samedirection by means of a timing belt 28.

The pulleys 25 and 26 have the same driving radius, and the pulleys 29and 30 have the same driving radius.

The timing belts 27 and 28 are the same.

A drive force from the motor 32 is transmitted from the shaft 31 to theholders 21 and 22 via the pulleys and belts in order to rotate theholders 21 and 22 at the same angular speed in the same direction withthe same timing.

In FIG. 15, 60 is a jet nozzle that jets a fluid and 61 is a shutter.For clarity, the illustration of the nozzle and shutter are simplified.

The nozzle 60 is fixed on the supporting stand 40 using a fixation jig(not shown), and a wafer positioning member 35 is provided on thesupporting stand 40 so as to be aligned with the nozzle 60.

FIG. 17 is a partially sectional view of the holder of the separationapparatus before it holds the wafer 20.

The holder 21 or 22 is an assembly of a holding section 45 a or 46 athat actually sucks and holds a wafer; a fixation section 45 b or 46 bthat rotates the holding section 45 a or 46 a together with the rotatingshaft 23 or 24; and detents 41 and 42 or 43 and 44.

Using a tube 52 and a pressurized gas passed through a pressurizingpassage 56, the holding section 45 a can move against a compressionspring (a coil spring 47) in a direction in which it leaves the rotatingshaft 23 (rightward in the figure).

An opening op is provided near the center of the holding section 45 aand is in communication with a pressure reducing passage 55 in therotating shaft. Using a vacuum pump (not shown) connected to the openingop via a pressure reducing tube 51, vacuum is drawn into the opening opto reduce the atmospheric pressure.

The holder 21 or 22 is moved forward (rightward in the figure) by havingits holder section 45 a that directly sucks the wafer, guided by therotating shaft 23, as shown in FIG. 17, and using the pressure of airintroduced from the pressurizing tube 52. The holder 21 or 22 is movedbackward (leftward in the figure) by the compression spring 47. Theholding section 45 a rotates with the rotating shaft 23 using thedetents 41 and 42. Basically, the holder 22 is specularly symmetricalwith the holder 21 and has the same mechanism as it. To allow the bondedwafer 20 and nozzle 60 to be always set at specified positions when thebonded wafer 20 is positioned and held on the holder 22, pressure iscontrolled and adjusted so that a stronger force is applied to theholder 21 than to the holder 22 during a forward operation, while astronger force is applied to the holder 22 than to the holder 21 duringa backward operation.

The usage of this apparatus, that is, the method for separating acomposite member according to this invention is described below. Thebonded wafer 20 is set so as to fit on a notch in a positioning stand35, as shown in FIG. 17. Pressurized air is then introduced to cause theholding section 45 a to advance, thereby allowing the holder 21 to suckand hold the wafer, as shown in FIG. 18. The holder 21 can fit thebonded wafer 20 on the notch in the positioning stand 35 to hold thecenter of the bonded wafer 20. When the bonded wafer 20 is held in anaccurate position, the nozzle 60 is located perpendicularly to the topof the bonded wafer 20 and the distance between the bonded wafer 20 andthe nozzle 60 is 10 to 30 mm. The holding section 46 a of the holder 22is moved forward (leftward in the figure) to suck and hold the bondedwafer 20, and the feeding of pressurized air of the holding section 46 ais stopped. The bonded wafer 20 is stopped due to a force actingrightward in the figure which is an combination of a force effected bythe compression spring and a vacuum suction force. The force effected bythe compression spring does not exceed the force required by the holdingsection 46 a to suck the bonded wafer 20, so the vacuum destruction ofthe inside of the pressure reducing passage 55 or 57 does not occur,which may in turn eliminate the suction force to cause the wafer 20 tofall.

A fluid is then fed from a pump 62 to the nozzle 60 for a specifiedperiod of time until the jetted fluid is stabilized. Once the fluid hasbeen stabilized, the shutter 61 is opened to jet the high-pressure fluidfrom the nozzle 60 against the thickness-wise center of the bonded wafer20. At this point, the speed controller motor 32 is rotated to rotatethe holders 21 and 22 in synchronism in order to rotate the wafer 20. Byjetting the high-pressure fluid against the thickness-wise center of thewafer 20, the high-pressure fluid also enters the separation region toextend the bonded wafer 20, thereby finally separating it into two.

Since the high-pressure fluid is applied uniformly against the bondedwafer 20 and the holders 21 and 22 each apply a force in a direction inwhich the bonded wafer 20 is drawn, as described above, separated piecesfurther leave each other and are prevented from sliding.

In addition, in the wafer supporting means shown in FIGS. 17 to 20, thewafer is supported while being subjected to a force by the holders 21and 22 in a direction in which the holders move backward from the wafer,but the holders 21 and 22 may effect a force in a forward direction andthis pressure may be used to hold the wafer. In this case, thehigh-pressure fluid also advances while extending the bonded wafer 20 tocreate a small gap, thereby finally causing the wafer to be separatedinto two. In this method, if the holders 21 and 22 do not synchronizemutually, the bonding surfaces of the separated pieces damage each otherdue to sliding, whereas if the holders rotate in synchronism, no damageoccurs. Furthermore, when a force is applied in a direction in which theholders 21 and 22 move backward, the wafer 20 is pulled to move backwardduring separation by the holders 21 and 22 and there may occur adifference in the amount of displacement between a separated portion andan unseparated portion to unbalance the bonded wafer 20, thereby causinga crack when the high-pressure fluid is jetted. If, however, a force isapplied to the holders 21 and 22 in a direction in which they moveforward, the bonded wafer 20 will maintain balance to enable the waferto be separated stably.

A high- or atmospheric-pressure fluid can be injected against theentirely separated wafer to effect a force in a direction in which itmoves backward in order to break the surface tension of interveningwater, thereby separating it into two completely.

As described above, the separation apparatus according to this inventionsequentially or simultaneously separates one or more composite membersusing a fluid. The composite members may be juxtaposed in the normaldirection of the surface or in parallel with the surface.

Alternatively, the composite members may be rotated or moved parallelwith the surface to receive the fluid, or the flow of the fluid may bemoved parallel with the surface so as to hit against the sides of thecomposite members, or the composite members and fluid may be movedtogether.

EXAMPLE 1

(One porous layer and nozzle scanning)

A first P-type (or N-type) single crystal Si substrate having aresistivity of 0.01 Ω·cm was placed in an HF solution for anodization.The anodization conditions are listed below.

Current density: 7 (mA·cm⁻²)

Anodization solution: HF: H₂O: C₂H₅OH=1:1:1

Time: 11 (minute)

Thickness of the porous Si layer: 12 (μm)

The porous Si layer is also used as a separation layer to form ahigh-quality epitaxial Si layer, that is, a single porous Si layerprovides multiple functions.

The thickness of the porous Si layer is not limited to the above valuebut may be between 0.1 and several hundred μm.

This substrate was oxidized in an oxygen atmosphere at 400° C. for onehour. The oxidization caused the inner wall of the pores in the porousSi layer to be covered with a thermally oxidized film. The surface ofthe porous Si layer was treated with hydrofluoric acid to remove onlythe oxidized film on the surface of the porous Si layer while leavingthe oxidized film on the inner wall of the pores, and the CVD was thenused to allow single crystal Si to epitaxially grow by 0.3 μm on theporous Si layer. The growth conditions are listed below.

Source gas: SiH₂Cl₂/H₂

Gas flow rate: 0.5/180 l/min.

Gas pressure: 80 Torr

Temperature: 950° C.

Growth speed: 0.3 μm/min.

Furthermore, a 200 nm thick oxide film (an SiO₂ layer) was formed on theepitaxial Si layer as an insulating layer, using thermal oxidation.

The surface of a separately prepared second Si substrate was placed onthe surface of the SiO₂ layer to contact them mutually. These substrateswere then subjected to thermal treatment at 1180° C. for five minutesfor bonding.

To separate the bonded substrate formed in this manner using theapparatus shown in FIG. 3, this bonded wafer was supported from bothsides by the wafer holders so as to stand perpendicularly. Anabrasive-material-free and high-pressure pure water was jetted at 2,000kgf/cm² from a 0.15-mm nozzle of a water jet apparatus located above thewafer against a gap in the wafer formed by bevelling, from a directionparallel with a bonding interface (surface) in the bonded wafer. Anozzle horizontal drive mechanism was used to scan the nozzle in adirection in which the high-pressure pure water moved along the gapformed by bevelling. In this case, when an elastomer 106 (e.g., Viton,fluoro rubber, or silicone rubber) was used in the portion in which thewafer and holder contact each other, the wafer could be opened in thevertical direction relative to its surface to allow the high-pressurewater to enter that part of the porous Si layer which was sandwiched bythe wafer holders, thereby enabling the wafer to be separated.

As a result, the SiO₂ layer, the epitaxial Si layer, and part of theporous Si layer which were originally formed on the surface of the firstsubstrate were transferred to the second substrate. Only the remainingpart of the porous Si layer remained on the surface of the firstsubstrate.

Subsequently, the porous Si layer transferred to the second substratewas selectively etched by being stirred using a mixture of 49%hydrofluoric acid and 30% hydrogen peroxide solution. The single crystalSi layer remained without being etched, whereas the porous Si layer wasentirely removed by selective etching using the single crystal Si layeras an etch stop material.

The speed at which a nonporous Si single crystal is etched by theetching solution is very low, and the selective ratio of this etchingspeed and the etching speed of the porous layer is 1:10⁵ or more. Thus,the amount of the etched portion of the nonporous layer (about severaltens of Angstrom) corresponds to the practically negligible reduction ofthe thickness.

The single crystal Si layer of 0.2 μm thickness was formed on the Sioxide film. The single crystal Si layer was not affected by theselective etching of the porous Si layer. When 100 points of the overallsurface of the single crystal Si layer formed were measured forthickness, the value obtained was 201 nm±4 nm.

An observation of the cross section by a transmission electronmicroscope indicated that new crystal defects did not occur in the Silayer and that excellent crystallinity was maintained.

Thermal treatment was further carried out in hydrogen at 1100° C. forone hour and the surface roughness was evaluated using an interatomicforce microscope. The mean square roughness of a 50-μm square region wasabout 0.2 nm and was similar to that of commercially available Siwafers.

Similar effects can be obtained by forming the oxide film on the surfaceof the second substrate instead of the surface of the epitaxial layer orforming it on both surfaces.

In addition, the porous Si layer remaining on the first substrate wasselectively etched by being stirred using a mixture of 40% hydrofluoricacid and 30% hydrogen peroxide solution. Subsequently, using hydrogenannealing or surface treatment such as surface polishing, the first orsecond substrate could be reused for the above process.

EXAMPLE 2

(Two porous layers and nozzle scanning)

A first P-type single crystal Si substrate having a resistivity of 0.01Ω·cm was subjected to two-step anodization in an HF solution to form twoporous layers. The anodization conditions are listed below.

First Step:

Current density: 7 (mA·cm⁻²)

Anodization solution: HF: H₂O: C₂H₅OH=1:1:1

Time: 5 (minute)

Thickness of the first porous Si layer: 4.5 (μm)

Second step:

Current density: 30 (mA·cm⁻²)

Anodization solution: HF: H₂O: C₂H₅OH=1:1:1

Time: 10 (second)

Thickness of the second porous Si layer: 0.2 (μm)

The two porous Si layers were formed, and the surface porous-Si layeranodized by a low current was used to form a high-quality epitaxial Silayer while the lower porous Si layer anodized by a high current wasused as a separation layer. That is, the functions were assigned to thedifferent layers. Thus, the thickness of the low-current porous Si layeris not limited to the above value but may be between 0.1 to severalhundred μm.

In addition, a third and subsequent layers may be formed on the secondporous Si layer.

This substrate was oxidized in an oxygen atmosphere at 400° C. for onehour. The oxidization caused the inner wall of the pores in the porousSi layer to be covered with a thermally oxidized film. The surface ofthe porous Si layer was treated with hydrofluoric acid to remove onlythe oxidized film on the surface of the porous Si layer while leavingthe oxidized film on the inner wall of the pores, and the CVD was thenused to allow single crystal Si to epitaxially grow by 0.3 μm on theporous Si layer. The growth conditions are listed below.

Source gas: SiH₂Cl₂/H₂

Gas flow rate: 0.5/180 l/min.

Gas pressure: 80 Torr

Temperature: 950° C.

Growth speed: 0.3 μm/min.

Furthermore, a 200 nm thick oxide film (an SiO₂ layer) was formed on theepitaxial Si layer as an insulating layer, using thermal oxidation.

The surface of a separately prepared second Si substrate was placed onthe surface of the SiO₂ layer to contact them mutually. These substrateswere then subjected to thermal treatment at 1180° C. for five minutesfor bonding.

The bonded substrate formed in this manner was separated using theapparatus shown in FIG. 3. A separation process similar to that inEmbodiment 1 was used. As a result, the SiO₂ layer, the epitaxial Silayer, and part of the porous Si layer which were originally formed onthe surface of the first substrate were transferred to the secondsubstrate. Only the remaining part of the porous Si layer remained onthe surface of the first substrate.

Subsequently, the porous Si layer transferred to the second substratewas selectively etched by being stirred using a mixture of 49%hydrofluoric acid and 30% hydrogen peroxide solution. The single crystalSi layer remained without being etched, whereas the porous Si layer wasentirely removed by selective etching using the single crystal Si layeras an etch stop material.

The single crystal Si layer of 0.2 μm thickness was formed on the Sioxide film. The single crystal Si layer was not affected by theselective etching of the porous Si layer. When 100 points of the overallsurface of the single crystal Si layer formed were measured forthickness, the value obtained was 200 nm±4 nm.

An observation of the cross section by the transmission electronmicroscope indicated that new crystal defects did not occur in the Silayer and that excellent crystallinity was maintained.

Thermal treatment was further carried out in hydrogen at 1100° C. forone hour and the surface roughness was evaluated using the interatomicforce microscope. The mean square roughness of a 50-μm square region wasabout 0.2 nm and was similar to that of commercially available Siwafers.

Similar effects can be obtained by forming the oxide film on the surfaceof the second substrate instead of the surface of the epitaxial layer orforming it on both surfaces.

In addition, the porous Si layer remaining on the first substrate wasselectively etched by being stirred using a mixture of 49% hydrofluoricacid and 30% hydrogen peroxide solution. Subsequently, using hydrogenannealing or surface treatment such as surface polishing, the first orsecond substrate could be reused to repeat the above process.

EXAMPLE 3

(Porous Si layer+separation layer formed by ion implantation and nozzlescanning)

A first P-type single crystal Si substrate having a resistivity of 0.01Ω·cm was subjected to anodization in an HF solution.

The anodization conditions are listed below.

Current density: 7 (mA·cm⁻²)

Anodization solution: HF: H₂O: C₂H₅OH=1:1:1

Time: 11 (minute)

Thickness of the porous Si layer: 12 (μm)

This substrate was oxidized in an oxygen atmosphere at 400° C. for onehour. The oxidization caused the inner wall of the pores in the porousSi layer to be covered with a thermally oxidized film. The surface ofthe porous Si layer was treated with hydrofluoric acid to remove onlythe oxidized film on the surface of the porous Si layer while leavingthe oxidized film on the inner wall of the pores, and the CVD was thenused to allow single crystal Si to epitaxially grow by 0.3 μm on theporous Si layer. The growth conditions are listed below.

Source gas: SiH₂Cl₂/H₂

Gas flow rate: 0.5/180 l/min.

Gas pressure: 80 Torr

Temperature: 950° C.

Growth speed: 0.3 μm/min.

Furthermore, a 200-nm oxide film (an SiO₂ layer) was formed on theepitaxial Si layer as an insulating layer, using thermal oxidation.

Ions were implanted from the surface of the first substrate in such away that their projected flights exists within the epitaxiallayer/porous Si interface, the porous Si/substrate interface, or theporous Si layer. This allowed a layer acting as a separation layer to beformed at a depth corresponding to the projected flight as a strainlayer formed by microcavities or concentrated implanted ions.

After pre-treatment such as N₂ plasma processing, the surface of aseparately prepared second Si substrate was placed on the surface of theSiO₂ layer to contact them mutually. These substrates were thensubjected to thermal treatment at 600° C. for 10 hours for bonding.

The bonded substrate formed in this manner was separated using theapparatus shown in FIG. 3. A separation process similar to that inExample 1 was used. As a result, the SiO₂ layer, the epitaxial Si layer,and part of the porous Si layer which were originally formed on thesurface of the first substrate were transferred to the second substrate.Only the remaining part of the porous Si layer remained on the surfaceof the first substrate.

Subsequently, the porous Si layer transferred to the second substratewas selectively etched by being stirred using a mixture of 49%hydrofluoric acid and 30% hydrogen peroxide solution. The single crystalSi layer remained without being etched, whereas the porous Si layer wasentirely removed by selective etching using the single crystal Si layeras an etch stop material.

The single crystal Si layer of 0.2 μm thickness was formed on the Sioxide film. The single crystal Si layer was not affected by theselective etching of the porous Si layer. When 100 points of the overallsurface of the single crystal Si layer formed were measured forthickness, the value obtained was 201 nm±4 nm.

An observation of the cross section by the transmission electronmicroscope indicated that new crystal defects did not occur in the Silayer and that excellent crystallinity was maintained.

Thermal treatment was further carried out in hydrogen at 1100° C. forone hour and the surface roughness was evaluated using the interatomicforce microscope. The mean square roughness of a 50-μm square region wasabout 0.2 nm and was similar to that of commercially available Siwafers.

Similar effects can be obtained by forming the oxide film on the surfaceof the second substrate instead of the surface of the epitaxial layer orforming it on both surfaces.

In addition, the porous Si layer remaining on the first substrate wasselectively etched by being stirred using a mixture of 49% hydrofluoricacid and 30% hydrogen peroxide solution. Subsequently, using hydrogenannealing or surface treatment such as surface polishing, the first orsecond substrate could be reused to repeat the above process.

According to this example, the ion implantation was carried out afterthe formation of the epitaxial Si layer, but ions may be implanted intothe porous Si layer or the porous Si/Si substrate interface prior to theepitaxial growth.

EXAMPLE 4

(Bubble layer formed by ion implantation and nozzle scanning)

A 200 nm thick oxide film (an SiO₂ layer) was formed on the first singlecrystal Si layer as an insulating layer, using thermal oxidation.

Ions were implanted from the surface of the first substrate in such away that their projected flight exists within the Si substrate. Thisallowed a layer acting as a separation layer to be formed at a depthcorresponding to the projected flight as a strain layer formed bymicrocavities or concentrated implanted ions.

After pre-treatment such as N₂ plasma processing, the surface of aseparately prepared second Si substrate was placed on the surface of theSiO₂ layer to contact them mutually. These substrates were thensubjected to thermal treatment at 600° C. for 10 hours for bonding.

The bonded substrate formed in this manner was separated using theapparatus shown in FIG. 3. A separation process similar to that inExample 1 was used.

As a result, the SiO₂ layer, the surface single crystal layer, and partof the separation layer which were originally formed on the surface ofthe first substrate were transferred to the second substrate. Only theremaining part of the separation layer remained on the surface of thefirst substrate.

Subsequently, the separation layer transferred to the second substratewas selectively etched by being stirred using a mixture of 49%hydrofluoric acid and 30% hydrogen peroxide solution. The single crystalSi layer remained without being etched, whereas the separation layer wasentirely removed by selective etching using the single crystal Si layeras an etch stop material.

This etching step may be omitted if the remaining separation layer issufficiently thin.

The single crystal Si layer of 0.2 μm thickness was formed on the Sioxide film. The single crystal Si layer was not affected by theselective etching of the separation layer. When 100 points of theoverall surface of the single crystal Si layer formed were measured forthickness, the value obtained was 201 nm±4 nm.

An observation of the cross section by the transmission electronmicroscope indicated that new crystal defects did not occur in the Silayer and that excellent crystallinity was maintained.

Thermal treatment was further carried out in hydrogen at 1100° C. forone hour and the surface roughness was evaluated using the interatomicforce microscope. The mean square roughness of a 50-μm square region wasabout 0.2 nm and was similar to that of commercially available Siwafers.

Similar effects can be obtained by forming the oxide film on the surfaceof the second substrate instead of the surface of the epitaxial layer orforming it on both surfaces.

In addition, the separation layer remaining on the first substrate wasselectively etched by being stirred using a mixture of 49% hydrofluoricacid and 30% hydrogen peroxide solution. Subsequently, using hydrogenannealing or surface treatment such as surface polishing, the first orsecond substrate could be reused to repeat the above process.

According to this example, the surface area of the Si wafer istransferred to the second substrate via the separation layer formed byion implantation, but an epi-wafer may be used to transfer the epitaxiallayer to the second substrate via the separation layer formed by ionimplantation. The following process is also possible. After the ionimplantation according to this example, the surface SiO₂ is removed andthe epitaxial layer and then the SiO₂ layer are formed, followed by thebonding step. The epitaxial layer is then transferred to the secondsubstrate via the separation layer formed by ion implantation. In thelatter case, the surface area of the Si wafer is also transferred.

EXAMPLE 5

(Horizontal placement and movement of the wafer)

A first P-type single crystal Si substrate having a resistivity of 0.01Ω·cm was subjected to anodization in an HF solution.

The anodization conditions are listed below.

Current density: 7 (mA·cm⁻²)

Anodization solution: HF: H₂O: C₂H₅OH=1:1:1

Time: 11 (minute)

Thickness of the porous Si layer: 12 (μm)

Porous Si was used to form a high-quality epitaxial Si layer and as aseparation layer.

The thickness of the porous Si layer is not limited to the above valuebut may be between 0.1 to several hundred μm.

This substrate was oxidized in an oxygen atmosphere at 400° C. for onehour. The oxidization caused the inner wall of the pores in the porousSi layer to be covered with a thermally oxidized film. The surface ofthe porous Si layer was treated with hydrofluoric acid to remove onlythe oxidized film on the surface of the porous Si layer while leavingthe oxidized film on the inner wall of the pores, and the CVD was thenused to allow single crystal Si to epitaxially grow by 0.3 μm on theporous Si layer. The growth conditions are listed below.

Source gas: SiH₂Cl₂/H₂

Gas flow rate: 0.5/180 l/min.

Gas pressure: 80 Torr

Temperature: 950° C.

Growth speed: 0.3 μm/min.

Furthermore, a 200 nm thick oxide film (an SiO₂ layer) was formed on theepitaxial Si layer as an insulating layer, using thermal oxidation.

The surface of a separately prepared second Si substrate was placed onthe surface of the SiO₂ layer to contact them mutually. These substrateswere then subjected to thermal treatment at 1180° C. for 5 minutes forbonding.

The bonded substrate formed in this manner was separated using theapparatus shown in FIG. 5. The wafer cassette 205 was placed on thecassette base 207 in such a way that the wafer 201 extended in thehorizontal direction, as shown in FIG. 5. High-pressure pure water at2,000 kgf/cm² was jetted from the 0.15-mm nozzles 202 and 203 of thewater jet apparatus located on the side of the wafer against the bondingregion in the bonded wafer through the gap therein formed by bevelling,from a direction parallel with the bonding interface (surface) in thebonded wafer. The nozzles were fixed and the bonded wafer was scanned inthe horizontal direction to receive the high-pressure pure water alongthe gap formed by bevelling.

This operation allowed the wafer to be divided into two via the porousSi layer. Then, another loading robot was used to store and collect theseparated wafer as a first and a second substrates.

The SiO₂ layer, the epitaxial Si layer, and part of the porous Si layerwhich were originally formed on the surface of the first substrate weretransferred to the second substrate. Only the remaining part of theporous Si layer remained on the surface of the first substrate.

Subsequently, the porous Si layer transferred to the second substratewas selectively etched by being stirred using a mixture of 49%hydrofluoric acid and 30% hydrogen peroxide solution. The single crystalSi layer remained without being etched, whereas the porous Si layer wasentirely removed by selective etching using the single crystal Si layeras an etch stop material.

The single crystal Si layer of 0.2 μm thickness was formed on the Sioxide film. The single crystal Si layer was not affected by theselective etching of the porous Si layer. When 100 points of the overallsurface of the single crystal Si layer formed were measured forthickness, the value obtained was 200 nm±5 nm.

An observation of the cross section by the transmission electronmicroscope indicated that new crystal defects did not occur in the Silayer and that excellent crystallinity was maintained.

Thermal treatment was further carried out in hydrogen at 1100° C. forone hour and the surface roughness was evaluated using the interatomicforce microscope. The mean square roughness of a 50-μm square region wasabout 0.2 nm and was similar to that of commercially available Siwafers.

Similar effects can be obtained by forming the oxide film on the surfaceof the second substrate instead of the surface of the epitaxial layer orforming it on both surfaces.

In addition, the porous Si layer remaining on the first substrate wasselectively etched by being stirred using a mixture of 49% hydrofluoricacid and 30% hydrogen peroxide solution. Subsequently, using hydrogenannealing or surface treatment such as surface polishing, the first orsecond substrate could be reused to repeat the above process.

EXAMPLE 6

(Oscillation of the nozzle)

A first P-type single crystal Si substrate having a resistivity of 0.01Ω·cm was subjected to anodization in an HF solution.

The anodization conditions are listed below.

Current density: 7 (mA·cm⁻²)

Anodization solution: HF: H₂O: C₂H₅OH=1:1:1

Time: 11 (minute)

Thickness of the porous Si layer: 12 (μm)

Porous Si was used to form a high-quality epitaxial Si layer and as aseparation layer.

This substrate was oxidized in an oxygen atmosphere at 400° C. for onehour. The oxidization caused the inner wall of the pores in the porousSi layer to be covered with a thermally oxidized film. The surface ofthe porous Si layer was treated with hydrofluoric acid to remove onlythe oxidized film on the surface of the porous Si layer while leavingthe oxidized film on the inner wall of the pores, and the CVD was thenused to allow single crystal Si to epitaxially grow by 0.3 μm on theporous Si layer. The growth conditions are listed below.

Source gas: SiH₂Cl₂/H₂

Gas flow rate: 0.5/180 l/min.

Gas pressure: 80 Torr

Temperature: 950° C.

Growth speed: 0.3 μm/min.

Furthermore, a 200 nm thick oxide film (an SiO₂ layer) was formed on theepitaxial Si layer as an insulating layer, using thermal oxidation.

The surface of a separately prepared Si substrate was placed on thesurface of the SiO₂ layer to contact them mutually. These substrateswere then subjected to thermal treatment at 1180° C. for 5 minutes forbonding.

The bonded substrate formed in this manner was separated using theapparatus shown in FIG. 6. As shown in this figure, the bonded wafer 301was allowed to stand in the vertical direction, and high-pressure purewater at 2,000 kgf/cm² was jetted from the 0.15-mm nozzle 302 of thewater jet apparatus located above the wafer against the bonding regionin the bonded wafer through the gap therein formed by bevelling, from adirection parallel with the bonding interface (surface) in the bondedwafer. Then, the nozzle 302 was oscillated within the same plane as thebonding surface in the wafer so as to draw a fan, in order to oscillatethe flow of the jet within this plane.

This operation allowed the wafer to be divided into two via the porousSi layer. As a result, the SiO₂ layer, the epitaxial Si layer, and partof the porous Si layer which were originally formed on the surface ofthe first substrate were transferred to the second substrate. Only theremaining part of the porous Si layer remained on the surface of thefirst substrate.

Subsequently, the porous Si layer transferred to the second substratewas selectively etched by being stirred using a mixture of 49%hydrofluoric acid and 30% hydrogen peroxide solution. The single crystalSi layer remained without being etched, whereas the porous Si layer wasentirely removed by selective etching using the single crystal Si layeras an etch stop material.

The single crystal Si layer of 0.2 μm thickness was formed on the Sioxide film. The single crystal Si layer was not affected by theselective etching of the porous Si layer. When 100 points of the overallsurface of the single crystal Si layer formed were measured forthickness, the value obtained was 201 nm±4 nm.

An observation of the cross section by the transmission electronmicroscope indicated that new crystal defects did not occur in the Silayer and that excellent crystallinity was maintained.

Thermal treatment was further carried out in hydrogen at 1100° C. forone hour and the surface roughness was evaluated using the interatomicforce microscope. The mean square roughness of a 50-μm square region wasabout 0.2 nm and was similar to that of commercially available Siwafers.

Similar effects can be obtained by forming the oxide film on the surfaceof the second substrate instead of the surface of the epitaxial layer orforming it on both surfaces.

In addition, the porous Si layer remaining on the first substrate wasselectively etched by being stirred using a mixture of 49% hydrofluoricacid and 30% hydrogen peroxide solution. Subsequently, using hydrogenannealing or surface treatment such as surface polishing, the first orsecond substrate could be reused to repeat the above process.

Similar results were obtained by separating wafers in which a separationlayer was formed according to Examples 2 to 4.

EXAMPLE 7

(Rotation of the wafer)

A first P-type single crystal Si substrate having a resistivity of 0.01Ω·cm was subjected to anodization in an HF solution.

The anodization conditions are listed below.

Current density: 7 (mA·cm⁻²)

Anodization solution: HF: H₂O: C₂H₅OH=1:1:1

Time: 11 (minute)

Thickness of the porous Si layer: 12 (μm)

Porous Si was used to form a high-quality epitaxial Si layer and as aseparation layer.

This substrate was oxidized in an oxygen atmosphere at 400° C. for onehour. The oxidization caused the inner wall of the pores in the porousSi layer to be covered with a thermally oxidized film. The surface ofthe porous Si layer was treated with hydrofluoric acid to remove onlythe oxidized film on the surface of the porous Si layer while leavingthe oxidized film on the inner wall of the pores, and the CVD was thenused to allow single crystal Si to epitaxially grow by 0.3 μm on theporous Si layer. The growth conditions are listed below.

Source gas: SiH₂Cl₂/H₂

Gas flow rate: 0.5/180 l/min.

Gas pressure: 80 Torr

Temperature: 950° C.

Growth speed: 0.3 μm/min.

Furthermore, a 200 nm thick oxide film (an SiO₂ layer) was formed on theepitaxial Si layer as an insulating layer, using thermal oxidation.

The surface of a separately prepared second Si substrate was placed onthe surface of the SiO₂ layer to contact them mutually. These substrateswere then subjected to thermal treatment at 1180° C. for 5 minutes forbonding.

The bonded substrate formed in this manner was separated using theapparatus shown in FIG. 4.

A bonded wafer 401 was allowed to stand in the vertical direction.

The bonded wafer 401 was set so as to fit on a positioning pin 413 andwas sucked and held by a holder 404. After the bonded wafer 401 was heldin an accurate position so as to fit on the positioning pin 413, thenozzle 402 was moved until it was located perpendicularly to the top ofthe bonded wafer 401 and the distance between the wafer 401 and thenozzle 402 was set at 15 mm. Then, a holder 403 was moved forward(leftward in the figure) via a bearing 411 until it sucked and held thewafer 401.

Then, water without abrasive material grains was fed from a water jetpump 414 to the nozzle 402 for a specified period of time until theinjected fluid was stabilized. Once the water had been stabilized, ashutter 406 was opened to inject the high-pressure pure water from thenozzle 402 against the thickness-wise center of the side of the bondedwafer 401. At this point, a holder 404 was rotated to rotate the bondedwafer 401 and holder 403. The high-pressure water also entered theporous Si layer to extend the bonded wafer 401, thereby enabling it tobe finally separated into two.

Subsequently, the porous Si layer transferred to the second substratewas selectively etched by being stirred using a mixture of 49%hydrofluoric acid and 30% hydrogen peroxide solution. The single crystalSi layer remained without being etched, whereas the porous Si layer wasentirely removed by selective etching using the single crystal Si layeras an etch stop material.

The single crystal Si layer of 0.2 μm thickness was formed on the Sioxide film. The single crystal Si layer was not affected by theselective etching of the porous Si layer. When 100 points of the overallsurface of the single crystal Si layer formed were measured forthickness, the value obtained was 200 nm±3 nm.

An observation of the cross section by the transmission electronmicroscope indicated that new crystal defects did not occur in the Silayer and that excellent crystallinity was maintained.

Thermal treatment was further carried out in hydrogen at 1100° C. forone hour and the surface roughness was evaluated using the interatomicforce microscope. The mean square roughness of a 50-μm square region wasabout 0.2 nm and was similar to that of commercially available Siwafers.

Similar effects can be obtained by forming the oxide film on the surfaceof the second substrate instead of the surface of the epitaxial layer orforming it on both surfaces.

In addition, the porous Si layer remaining on the first substrate wasselectively etched by being stirred using a mixture of 49% hydrofluoricacid and 30% hydrogen peroxide solution. Subsequently, using hydrogenannealing or surface treatment such as surface polishing, the first orsecond substrate could be reused to repeat the above process.

Similar results were obtained by separating wafers in which a separationlayer was formed according to Examples 2 to 4.

EXAMPLE 8

(Diagonal injection)

A first P-type single crystal Si substrate having a resistivity of 0.01Ω·cm was subjected to anodization in an HF solution.

The anodization conditions are listed below.

Current density: 7 (mA·cm⁻²)

Anodization solution: HF: H₂O: C₂H₅OH=1:1:1

Time: 11 (minute)

Thickness of the porous Si layer: 12 (μm)

Porous Si was used to form a high-quality epitaxial Si layer and as aseparation layer.

The thickness of the porous Si layer is not limited to the above valuebut may be between 0.1 to several hundred μm.

This substrate was oxidized in an oxygen atmosphere at 400° C. for onehour. The oxidization caused the inner wall of the pores in the porousSi layer to be covered with a thermally oxidized film. The surface ofthe porous Si layer was treated with hydrofluoric acid to remove onlythe oxidized film on the surface of the porous Si layer while leavingthe oxidized film on the inner wall of the pores, and the CVD was thenused to allow single crystal Si to epitaxially grow by 0.3 μm on theporous Si layer. The growth conditions are listed below.

Source gas: SiH₂Cl₂/H₂

Gas flow rate: 0.5/180 l/min.

Gas pressure: 80 Torr

Temperature: 950° C.

Growth speed: 0.3 μm/min.

Furthermore, a 200 nm thick oxide film (an SiO₂ layer) was formed on theepitaxial Si layer as an insulating layer, using thermal oxidation.

The surface of a separately prepared second Si substrate was placed onthe surface of the SiO₂ layer to contact them mutually. These substrateswere then subjected to thermal treatment at 1180° C. for 5 minutes forbonding.

A bonded wafer was allowed to stand in the vertical direction, andhigh-pressure pure water at 2,000 kgf/cm² was jetted from the 0.15-mmdiameter nozzle of the water jet apparatus located above the waferagainst the bonding region in the bonded wafer through the gap thereinformed by bevelling, from a direction inclined at an angle a from thebonding interface (surface).

The wafer was held by the apparatus shown in FIG. 4 and the nozzle wasdisposed as shown in FIG. 8 to inject the fluid against the side of thewafer.

Subsequently, the porous Si layer transferred to the second substratewas selectively etched by being stirred using a mixture of 49%hydrofluoric acid and 30% hydrogen peroxide solution. The single crystalSi layer remained without being etched, whereas the porous Si layer wasentirely removed by selective etching using the single crystal Si layeras an etch stop material.

The single crystal Si layer of 0.2 μm thickness was formed on the Sioxide film. The single crystal Si layer was not affected by theselective etching of the porous Si layer. When 100 points of the overallsurface of the single crystal Si layer formed were measured forthickness, the value obtained was 201 nm±4 nm.

An observation of the cross section by the transmission electronmicroscope indicated that new crystal defects did not occur in the Silayer and that excellent crystallinity was maintained.

Thermal treatment was further carried out in hydrogen at 1100° C. forone hour and the surface roughness was evaluated using the interatomicforce microscope. The mean square roughness of a 50-μm square region wasabout 0.2 nm and was similar to that of commercially available Siwafers.

Similar effects can be obtained by forming the oxide film on the surfaceof the second substrate instead of the surface of the epitaxial layer orforming it on both surfaces.

In addition, the porous Si layer remaining on the first substrate wasselectively etched by being stirred using a mixture of 49% hydrofluoricacid and 30% hydrogen peroxide solution. Subsequently, using hydrogenannealing or surface treatment such as surface polishing, the first orsecond substrate could be reused to repeat the above process.

Similar results were obtained by separating wafers in which a separationlayer was formed according to Examples 2 to 4.

EXAMPLE 9

(A plurality of jets)

A first P-type single crystal Si substrate having a resistivity of 0.01Ω·cm was subjected to anodization in an HF solution.

The anodization conditions are listed below.

Current density: 7 (mA·cm⁻²)

Anodization solution: HF: H₂O: C₂H₅OH=1:1:1

Time: 11 (minute)

Thickness of the porous Si layer: 12 (μm)

Porous Si was used to form a high-quality epitaxial Si layer and as aseparation layer.

The thickness of the porous Si layer is not limited to the above valuebut may be between 0.1 to several hundred μm.

This substrate was oxidized in an oxygen atmosphere at 400° C. for onehour. The oxidization caused the inner wall of the pores in the porousSi layer to be covered with a thermally oxidized film. The surface ofthe porous Si layer was treated with hydrofluoric acid to remove onlythe oxidized film on the surface of the porous Si layer while leavingthe oxidized film on the inner wall of the pores, and the CVD was thenused to allow single crystal Si to epitaxially grow by 0.3 μm on theporous Si layer. The growth conditions are listed below.

Source gas: SiH₂Cl₂/H₂

Gas flow rate: 0.5/180 l/min.

Gas pressure: 80 Torr

Temperature: 950° C.

Growth speed: 0.3 μm/min.

Furthermore, a 200-nm oxide film (an SiO₂ layer) was formed on theepitaxial Si layer, using thermal oxidation.

The surface of a separately prepared second Si substrate was placed onthe surface of the SiO₂ layer to contact them mutually. These substrateswere then subjected to thermal treatment at 1180° C. for 5 minutes forbonding.

The bonded substrate formed in this manner was separated using theapparatus shown in FIG. 9.

A shown in FIG. 9, the wafer holder 708 was used to hold both sides ofthe bonded wafer 701 so as to stand in the vertical direction.High-pressure pure water at 2,000 kgf/cm² was jetted against the gap inthe wafer 701 formed by bevelling, through the 0.15 mm nozzles 702 to704 of the three water jet apparatuses located above or on the side ofthe wafer, from a direction parallel with the bonding interface(surface) in the bonded wafer. A plurality of nozzles were scanned in adirection in which the high-pressure pure water moved along the gapformed by bevelling.

This operation allowed the wafer to be separated into two via the porousSi layer.

As a result, the SiO₂ layer, the epitaxial Si layer, and part of theporous Si layer which were originally formed on the surface of the firstsubstrate were transferred to the second substrate. Only the remainingpart of the porous Si layer remained on the surface of the firstsubstrate.

Subsequently, the porous Si layer transferred to the second substratewas selectively etched by being stirred using a mixture of 49%hydrofluoric acid and 30% hydrogen peroxide solution. The single crystalSi layer remained without being etched, whereas the porous Si layer wasentirely removed by selective etching using the single crystal Si layeras an etch stop material.

The single crystal Si layer of 0.2 μm thickness was formed on the Sioxide film. The single crystal Si layer was not affected by theselective etching of the porous Si layer. When 100 points of the overallsurface of the single crystal Si layer formed were measured forthickness, the value obtained was 201 nm±4 nm.

An observation of the cross section by the transmission electronmicroscope indicated that new crystal defects did not occur in the Silayer and that excellent crystallinity was maintained.

Thermal treatment was further carried out in hydrogen at 1100° C. forone hour and the surface roughness was evaluated using the interatomicforce microscope. The mean square roughness of a 50-μm square region wasabout 0.2 nm and was similar to that of commercially available Siwafers.

Similar effects can be obtained by forming the oxide film on the surfaceof the second substrate instead of the surface of the epitaxial layer orforming it on both surfaces.

In addition, the porous Si layer remaining on the first substrate wasselectively etched by being stirred using a mixture of 49% hydrofluoricacid and 30% hydrogen peroxide solution. Subsequently, using hydrogenannealing or surface treatment such as surface polishing, the first orsecond substrate could be reused to repeat the above process.

Similar results were obtained by separating wafers in which a separationlayer was formed according to Examples 2 to 4.

The bonded wafer could also be separated efficiently by using aplurality of nozzles in the water jet injection methods according toExamples 5 to 8.

EXAMPLE 10

(Slit jet)

A first P-type single crystal Si substrate having a resistivity of 0.01Ω·cm was subjected to anodization in an HF solution.

The anodization conditions are listed below.

Current density: 7 (mA·cm⁻²)

Anodization solution: HF: H₂O: C₂H₅OH=1:1:1

Time: 11 (minute)

Thickness of the porous Si layer: 12 (μm)

Porous Si was used to form a high-quality epitaxial Si layer and as aseparation layer.

The thickness of the porous Si layer is not limited to the above valuebut may be between 0.1 to several hundred μm.

This substrate was oxidized in an oxygen atmosphere at 400° C. for onehour. The oxidization caused the inner wall of the pores in the porousSi layer to be covered with a thermally oxidized film. The surface ofthe porous Si layer was treated with hydrofluoric acid to remove onlythe oxidized film on the surface of the porous Si layer while leavingthe oxidized film on the inner wall of the pores, and the CVD was thenused to allow single crystal Si to epitaxially grow by 0.3 μm on theporous Si layer. The growth conditions are listed below.

Source gas: SiH₂Cl₂/H₂

Gas flow rate: 0.5/180 l/min.

Gas pressure: 80 Torr

Temperature: 950° C.

Growth speed: 0.3 μm/min.

Furthermore, a 200 nm thick oxide film (an SiO₂ layer) was formed on theepitaxial Si layer as an insulating layer, using thermal oxidation.

The surface of a separately prepared second Si substrate was placed onthe surface of the SiO₂ layer to contact them mutually. These substrateswere then subjected to thermal treatment at 1180° C. for 5 minutes forbonding.

The bonded substrate formed in this manner was separated using theapparatus shown in FIGS. 10A and 10B.

A shown in FIGS. 10A and 10B, the bonded wafer was allowed to stand inthe vertical direction, and high-pressure pure water at 800 kgf/cm² wasjetted against the gap in the wafer formed by bevelling, through aslit-like nozzle of 0.15 mm width and 50 mm length of the water jetapparatus located above or on the side of the wafer, from a directionparallel with the bonding interface (surface) in the bonded wafer. Theslit was located parallel with the bonding interface (surface) in thebonded wafer and a linear flow of water was injected accurately againstthe gap in the wafer formed by bevelling. A plurality of nozzles werescanned in a direction in which the high-pressure pure water moved alongthe gap formed by bevelling.

This operation allowed the wafer to be separated into two via the porousSi layer.

As a result, the SiO₂ layer, the epitaxial Si layer, and part of theporous Si layer which were originally formed on the surface of the firstsubstrate were transferred to the second substrate. Only the remainingpart of the porous Si layer remained on the surface of the firstsubstrate.

Subsequently, the porous Si layer transferred to the second substratewas selectively etched by being stirred using a mixture of 49%hydrofluoric acid and 30% hydrogen peroxide solution. The single crystalSi layer remained without being etched, whereas the porous Si layer wasentirely removed by selective etching using the single crystal Si layeras an etch stop material.

The single crystal Si layer of 0.2 μm thickness was formed on the Sioxide film. The single crystal Si layer was not affected by theselective etching of the porous Si layer. When 100 points of the overallsurface of the single crystal Si layer formed were measured forthickness, the value obtained was 201 nm±4 nm.

An observation of the cross section by the transmission electronmicroscope indicated that new crystal defects did not occur in the Silayer and that excellent crystallinity was maintained.

Thermal treatment was further carried out in hydrogen at 1100° C. forone hour and the surface roughness was evaluated using the interatomicforce microscope. The mean square roughness of a 50-μm square region wasabout 0.2 nm and was similar to that of commercially available Siwafers.

Similar effects can be obtained by forming the oxide film on the surfaceof the second substrate instead of the surface of the epitaxial layer orforming it on both surfaces.

In addition, the porous Si layer remaining on the first substrate wasselectively etched by being stirred using a mixture of 49% hydrofluoricacid and 30% hydrogen peroxide solution. Subsequently, using hydrogenannealing or surface treatment such as surface polishing, the first orsecond substrate could be reused to repeat the above process.

Similar results were obtained by separating wafers in which a separationlayer was formed according to Examples 2 to 4.

EXAMPLE 11

(Quartz substrate)

A light-transmissive substrate of quartz was prepared as a secondsubstrate.

N₂ plasma processing was applied to the surface of the quartz prior tobonding and thermal treatment was carried out at 400° C. for 100 hours.Then, thermal treatment under hydrogen for flattening the SOI surfaceafter separation was carried out at less than 1000° C., in this case,970° C. for 4 hours.

The other process is the same as in Examples 1 to 10.

If a transparent substrate of an insulating material is used as thesecond substrate, the oxide film (the insulating layer) formed on thesurface of the epitaxial Si layer in Examples 1 to 10 is not necessarilyimportant. However, to space the epitaxial Si layer on which elementssuch as transistors will subsequently be formed, from the bondinginterface to reduce the effects of impurities in the interface, theoxide film (the insulating layer) is preferably formed.

EXAMPLE 12

(GaAs on Si)

Examples 1 to 10 could be similarly implemented by forming the epitaxiallayer of a compound semiconductor represented by GaAs.

In this case, the pressure of the water jet was maintained at 500 to3,500 kgf/cm² and the nozzle had a diameter of 0.1 mm or more (half thatof the total bonded wafer thickness).

The method for allowing the GaAs epitaxial layer to grow on the porousSi layer is not limited to the CVD method but may be implemented byvarious methods such as the MBE, sputtering, and liquid phase growthmethods. The thickness of this layer is between several nm andseveral-hundred μm.

In each of these examples, the selective etching liquid for the ionimplantation layer or porous layer is not limited to the mixture of 49%hydrofluoric acid and 30% hydrogen peroxide solution, but due to itsenormous surface area, the porous Si layer can be etched using thefollowing liquids:

Hydrofluoric acid;

Hydrofluoric acid+alcohol;

Hydrofluoric acid+alcohol+hydrogen peroxide solution;

Buffered hydrofluoric acid;

Buffered hydrofluoric acid+alcohol;

Buffered hydrofluoric acid+hydrogen peroxide solution;

Buffered hydrofluoric acid+alcohol+hydrogen peroxide solution;

a mixture of hydrofluoric, nitric, and acetic acids.

The other steps are not limited to the conditions in these examples butvarious other conditions can be used.

EXAMPLE 13

(Rotation of the wafer)

A disc-like P-type single crystal Si wafer having a resistivity of 0.01Ω·cm was prepared as a first Si substrate and had its surface subjectedto anodization in an HF solution.

The anodization conditions are listed below.

Current density: 7 (mA·cm⁻²)

Anodization solution: HF: H₂O: C₂H₅OH=1:1:1

Time: 11 (minute)

Thickness of the porous Si layer: 12 (μm)

This wafer was oxidized in an oxygen atmosphere at 400° C. for one hour.The oxidization caused the inner wall of the pores in the porous Silayer to be covered with a thermally oxidized film. The surface of theporous Si layer was treated with hydrofluoric acid to remove only theoxidized film on the surface of the porous Si layer while leaving theoxidized film on the inner wall of the pores, and the CVD was then usedto allow single crystal Si to epitaxially grow by 0.3 μm on the porousSi layer. The growth conditions are listed below.

Source gas: SiH₂Cl₂/H₂

Gas flow rate: 0.5/180 l/min.

Gas pressure: 80 Torr

Temperature: 950° C.

Growth speed: 0.3 μm/min.

Furthermore, a 200 nm thick oxide film (an SiO₂ layer) was formed on theepitaxial Si layer as an insulating layer, using thermal oxidation.

Besides the first substrate formed in this manner, a disc-like Si waferwas prepared as a second Si substrate.

The surface of the second Si substrate was placed on the surface of theSiO₂ layer of the first Si substrate to contact them mutually. Thesesubstrates were then subjected to thermal treatment at 1180° C. for 5minutes for bonding.

Next, preparations were made to separate the composite member consistingof the bonded wafer using the apparatuses shown in FIGS. 14, 15, and 17to 20.

The wafer, which is the composite member, was located so as to stand inthe vertical direction while fitting on the notch in the positioningbase 35.

Pressurized air was supplied from the tubes 52 and 54 to thepressurizing passage 56, and the holding sections 45 a and 46 a weremoved forward to the front and rear surfaces of the wafer, respectively,in order to abut the front and rear surfaces of the wafer with theholding surface of the holding sections 45 a and 46 a each having anopening op, respectively, as shown in FIG. 18.

Using the tubes 51 and 53, the wafer was sucked and fixed to the holdingsections 45 a and 46 a. The supply of pressurized air was stopped andtension was supplied to the wafer in the opposite normal directions ofthe front and rear surfaces of the wafer using the springs 47 and 48.

With the shutter 61 closed, pure water without abrasive grains was fedforcefully from the pump 62 to the nozzle of 0.15 mm diameter and thepump 62 was operated to inject water at a pressure of about 200 kgf/cm².

The positioning base 35 was moved to its standby position, and the powerto the motor 32 was turned on to transmit rotational drive force via theshaft 31 and belts 27 and 28 in order to rotate the holders 21 and 22.

Since the wafer was sucked by the holding sections 45 a and 46 a, itstarted to rotate simultaneously with the holders 21 and 22 at the sameangular speed in the same direction.

The shutter 61 was opened to inject the water jet against the separationportion in the side of the wafer, as shown in FIG. 19.

Water from the water jet apparatus entered the pores in the separationportion to separate the wafer around the porous layer that is theseparation portion.

As the injection of the water jet and the rotation of the wafercontinue, the gap formed by separation gradually grew from the peripheryof the wafer toward its rotational center and the wafer could be finallyseparated as shown in FIG. 20.

Since the wafer was subjected to forces in the directions shown arrowsTA and TB in FIG. 20, the wafer was separated as shown in FIG. 20,simultaneously with the final separation of the rotational center of thewafer.

Subsequently, the forced feeding of water was stopped and the separatedwafer was removed from the holding sections 45 a and 46 a.

Subsequently, the remaining porous Si layer transferred to the secondsubstrate was selectively etched by being stirred using a mixture of 49%hydrofluoric acid and 30% hydrogen peroxide solution. The transferredsingle crystal Si layer under the porous layer remained without beingetched, whereas the porous Si layer was entirely removed by selectiveetching using the single crystal Si layer as an etch stop material,thereby exposing the thin single crystal Si layer.

Thus, a first SOI substrate having the single crystal Si layer of 0.2 μmthickness on the Si oxide film of the second substrate was obtained. Thesingle crystal Si layer was not affected by the selective etching of theporous Si layer. When 100 points of the overall surface of the singlecrystal Si layer formed were measured for thickness, the value obtainedwas 201 nm±2 nm.

An observation of the cross section by the transmission electronmicroscope indicated that new crystal defects did not occur in the Silayer and that excellent crystallinity was maintained.

Thermal treatment was further carried out in hydrogen at 1100° C. for 50minutes and the surface roughness was evaluated using the interatomicforce microscope. The mean square roughness of a 50-μm square region wasabout 0.2 nm.

In addition, the porous Si layer remaining on the first substrate wasselectively etched by being stirred using a mixture of 49% hydrofluoricacid and 30% hydrogen peroxide solution. Subsequently, surface treatmentsuch as polishing was carried out.

The first substrate, which had been polished, was again subjected toanodization to form a porous Si layer and nonporous single crystal Siwas allowed to grow thereon. The surface of the nonporous single crystalSi layer, which had grown epitaxially, was oxidized. Then, the surfaceof a separately prepared Si wafer that was a third substrate was bondedon the oxidized surface of the single crystal Si layer of the firstsubstrate.

The conditions for the above process w ere the same as those for thefirst bonded-wafer production.

The wafer was again separated in the same manner as in the firstseparation method described above to obtain a second SOI substratehaving the single crystal Si layer on the insulating surface of thethird substrate.

The above process was repeated to recycle the first substrate in orderto fabricate a third and a fourth SOI substrates.

As described above, this invention enables a composite member having aseparation region inside to be separated into a plurality of smallermembers around the separation region without damaging or destructingthose portions other than the separation region. Therefore, thisinvention enables semiconductor substrates with higher quality than theconventional ones to be fabricated easily and reliably with a highyield.

What is claimed is:
 1. A separation apparatus comprising: a holdingmeans for holding a composite member having a plurality of mutuallybonded members; a jetting means for jetting a fluid against a sidesurface of the composite member; and a movement mechanism for relativelymoving the composite member and the jetting means; wherein the holdingmeans holds the composite member so that the fluid is jetted against anentire periphery of the side surface of the composite member, andwherein the composite member is separated at a position different from abonding position of the plurality of members.
 2. The separationapparatus according to claim 1 wherein the jetting means jetshigh-pressure water from a nozzle.
 3. The separation apparatus accordingto claim 2 wherein the composite member is fixed while the nozzle isscanned in order to scan the flow of water.
 4. The separation apparatusaccording to claim 3 having a holder for holding the composite member; anozzle horizontal movement mechanism for moving the nozzle in thehorizontal direction along the bonding position of the compositematerial; and a nozzle vertical movement mechanism for adjusting thevertical distance between the composite member and the nozzle.
 5. Theseparation apparatus according to claim 3 having a mechanism forscanning the nozzle in such a way as to draw a fan around a supportingpoint.
 6. The separation apparatus according to claim 3 wherein thenozzle rotates around the composite member.
 7. The separation apparatusaccording to claim 3 including a plurality of the nozzles.
 8. Theseparation apparatus according to claim 2 wherein the composite memberis scanned while the nozzle is fixed in order to scan the flow of water.9. The separation apparatus according to claim 8 having a rotationmechanism for rotating the composite member.
 10. The separationapparatus according to claim 9 wherein the nozzle is located so as to bedirected toward the rotational center of the composite member.
 11. Theseparation apparatus according to claim 9 having a rotation holdingmember for holding the rotational center of the composite member. 12.The separation apparatus according to claim 1, wherein the jetting meansjets the fluid against the side surface having a recessed or narrow gap.13. The separation apparatus according to claim 1, wherein the positiondifferent from the bonding position of the plurality of mutually bondedmembers is a separation region including microcavities, distortions ordefects.
 14. A separation apparatus comprising a first holder forrotatably holding a first surface of a disc-like composite member havinga plurality of members as bonded mutually; a second holder for rotatablyholding a second surface of the disc-like composite member;synchronizing means for allowing the first and second holders duringrotation to synchronize mutually; and a nozzle that jets a fluid againstthe end surface of the composite member, which is rotating, in order toseparate the composite member into a plurality of members using as astarting point the position on which the fluid has been jetted.
 15. Theseparation apparatus according to claim 14 having means for setting theposition of the nozzle so that the fluid is jetted against a separationposition different from the bonding position of the composite member.16. The separation apparatus according to claim 14 wherein a recessedportion is provided in the end surface of the composite member and theapparatus has means for setting the position of said nozzle so that thefluid is jetted against the bottom of the recessed portion.
 17. Aseparation apparatus comprising: a holding means for holding a compositemember having a plurality of mutually bonded members; a jetting meansfor jetting a fluid against a side surface of the composite member; anda movement mechanism for relatively moving the composite member and thejetting means; wherein the holding means holds the composite member sothat the fluid is jetted against an entire periphery of the side surfaceof the composite member, and wherein the composite member is separated.18. A separation apparatus comprising: a holding means for holding acomposite member being a plurality of mutually bonded members and havinga separation region formed by anodization or ion implantation; and ajetting means for jetting a fluid against a side surface of thecomposite member; wherein the holding means holds the composite memberso that the fluid is jetted against an entire periphery of the sidesurface of the composite member, and wherein the composite member isseparated at a position different from a bonding position of theplurality of members.
 19. A separation apparatus comprising: a holdingmeans for holding a composite member being a plurality of mutuallybonded members and having a separation region formed by anodization orion implantation; and means for applying a pressure by a fluid against aside surface of the composite member; wherein the holding means holdsthe composite member so that the fluid is jetted against an entireperiphery of the side surface of the composite member, and wherein thecomposite member is separated at a position different from a bondingposition of the plurality of members.
 20. A separation apparatuscomprising: a first holder for holding a first member of a bondedsubstrate formed by bonding the first member and a second member; asecond holder for holding the second member of the bonded substrate; anda nozzle for jetting a fluid against a side surface of the bondedsubstrate to separate the bonded substrate, wherein the first holder andthe second holder hold the first member and the second member so thatthe first member and the second member are synchronously rotated.